Electron Beam-plasma Vacuum Deposition of Very Thin Carbon Films: Photocathode Application

Abstract

Very thin carbon films were deposited by electron beam-plasma vacuum deposition technique on quartz and sapphire substrates. The concentration of elements was determined by RBS and ERD analytical method simultaneously. Concentrations of elements were practically the same for all samples. Raman spectroscopy and deconvolution of Raman spectra was used for chemical structural features determination of carbon films. Raman spectroscopy results showed that films contained several carbon phases. The photo-induced electron emission characteristics of very thin carbon films on quartz and sapphire substrates as back-side illuminated transmission photocathode are discussed. Best electron emission properties exhibit transmission photocathode with very thin carbon film prepared on sapphire substrate at lower substrate temperature.