Comparative analysis of 300 mm FAB architectures impact of equipment sets on wafer cost and dynamic performance

R. Bachrach, M. Pool, K. Genovese, J.C. Moran, M. O'Halloran, T. J. Connolly
{"title":"Comparative analysis of 300 mm FAB architectures impact of equipment sets on wafer cost and dynamic performance","authors":"R. Bachrach, M. Pool, K. Genovese, J.C. Moran, M. O'Halloran, T. J. Connolly","doi":"10.1109/ISSM.2001.962992","DOIUrl":null,"url":null,"abstract":"A semiconductor fabricator is a highly complex system that hosts the process tools capable of manufacturing IC product devices based upon their process flows. A typical process flow for a 0.15 /spl mu/m logic process consists of 300 to 400 steps with 22 to 24 mask steps. A variety of equipment sets and organizational architectures are possible for any process flow. The results of a comparative analysis of two such 300 mm FAB architectures are presented in this report. The impact of equipment sets on fab Sizing, Cost, and Performance are described as a function of operating characteristics.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.962992","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

A semiconductor fabricator is a highly complex system that hosts the process tools capable of manufacturing IC product devices based upon their process flows. A typical process flow for a 0.15 /spl mu/m logic process consists of 300 to 400 steps with 22 to 24 mask steps. A variety of equipment sets and organizational architectures are possible for any process flow. The results of a comparative analysis of two such 300 mm FAB architectures are presented in this report. The impact of equipment sets on fab Sizing, Cost, and Performance are described as a function of operating characteristics.
300mm晶圆厂架构对比分析设备组对晶圆成本和动态性能的影响
半导体制造商是一个高度复杂的系统,它拥有能够根据其工艺流程制造IC产品器件的工艺工具。0.15 /spl mu/m逻辑流程的典型流程由300至400个步骤组成,其中包含22至24个掩码步骤。对于任何工艺流程,都可能有各种各样的设备集和组织架构。本报告介绍了两种300mm FAB架构的比较分析结果。设备组对晶圆厂尺寸、成本和性能的影响被描述为运行特性的函数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信