Reliability study of gallium arsenide transistors

R. H. Maurer, K. Chao, E. Nhan, R. Benson, C. Bargeron
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引用次数: 3

Abstract

GaAs signal transistors of the MESFET and HEMT (high electron mobility transistor) technologies were evaluated in an accelerated life test to determine their reliability for space-borne applications. It was found that GaAs MESFET technology is sufficiently mature and reliable for space systems, but that the GaAs HEMT technology is not. Secondary electron and source current imaging of an NE 202 HEMT which had failed during life testing show a bright spot indicating a subsurface defect. The effect of this defect is to short the transistor so that it cannot be turned off. It is concluded that the subsurface defect causing failure in the NE 202 HEMT was either a latent defect present originally in the GaAs material or created during the aging test by the thermal runaway/bridging phenomenon.<>
砷化镓晶体管可靠性研究
MESFET和HEMT(高电子迁移率晶体管)技术的GaAs信号晶体管在加速寿命试验中进行了评估,以确定其在星载应用中的可靠性。研究发现,GaAs MESFET技术在空间系统中已经足够成熟和可靠,但GaAs HEMT技术还不够成熟和可靠。在寿命测试中失败的NE 202 HEMT的二次电子和源电流成像显示一个亮点,表明表面下缺陷。这个缺陷的作用是使晶体管短路,使它不能关断。由此得出结论,导致ne202 HEMT失效的亚表面缺陷要么是GaAs材料本身存在的潜在缺陷,要么是在老化试验过程中由热失控/桥接现象产生的。
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