The study of the phase composition of polymorphous silicon film by Raman spectroscopy

Abstract

This paper presents the results of the study based on the phase composition of thin films of polymorphic silicon on various parameters of plasma chemical deposition by method of Raman spectroscopy. The phase composition of films is of great importance in the manufacture of solar cells. Raman spectroscopy allows to know the dimensions of the crystallites and their uniform distribution in the film.