The Future of Test -- Product Integration and its Impact on Test

Michael Campbell
{"title":"The Future of Test -- Product Integration and its Impact on Test","authors":"Michael Campbell","doi":"10.1109/DFT.2009.67","DOIUrl":null,"url":null,"abstract":"Driving leading edge products with high quality while designs, flows, and processes advance with Moore’s Law will require the semiconductor industry to continue to drive for increasing innovative DFT strategies. The test industry will need to drive for new ideas in the areas of: yield analysis, modeling, test techniques, and defect / fault tolerance. To continue cost effective products while costs escalate, yield analysis will need to take far greater consideration of advanced statistical techniques including consideration of spatial randomness. As UDSM processes become more sensitive to variations in lithography, random particle defects, overlay errors, and printability, it is inevitable that new methods will need to be developed to address the economics of Moore’s Law. At the same time, this convergence will put more demand on design/ circuit techniques as well as the need for advanced yield and process control techniques. IP integration drives intersection of dissimilar IP (EG: low power, high speed, RF, etc) requirements where the need for fault tolerant design will be required to achieve HVM. The key area for new DFT development is analog like methods to accommodate defect tolerance will be required HSIO, integrated RF cores, as well as the introduction of non-conventional fabrication methods are required to meet cost, quality and reliability demands.","PeriodicalId":405651,"journal":{"name":"2009 24th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 24th IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DFT.2009.67","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Driving leading edge products with high quality while designs, flows, and processes advance with Moore’s Law will require the semiconductor industry to continue to drive for increasing innovative DFT strategies. The test industry will need to drive for new ideas in the areas of: yield analysis, modeling, test techniques, and defect / fault tolerance. To continue cost effective products while costs escalate, yield analysis will need to take far greater consideration of advanced statistical techniques including consideration of spatial randomness. As UDSM processes become more sensitive to variations in lithography, random particle defects, overlay errors, and printability, it is inevitable that new methods will need to be developed to address the economics of Moore’s Law. At the same time, this convergence will put more demand on design/ circuit techniques as well as the need for advanced yield and process control techniques. IP integration drives intersection of dissimilar IP (EG: low power, high speed, RF, etc) requirements where the need for fault tolerant design will be required to achieve HVM. The key area for new DFT development is analog like methods to accommodate defect tolerance will be required HSIO, integrated RF cores, as well as the introduction of non-conventional fabrication methods are required to meet cost, quality and reliability demands.
测试的未来——产品集成及其对测试的影响
在设计、流程和工艺按照摩尔定律推进的同时,推动高质量的前沿产品,将要求半导体行业继续推动不断增加的创新DFT策略。测试行业将需要在以下领域推动新的想法:屈服分析、建模、测试技术和缺陷/容错。为了在成本上升的同时继续生产具有成本效益的产品,产量分析将需要更多地考虑先进的统计技术,包括考虑空间随机性。随着UDSM工艺对光刻、随机颗粒缺陷、覆盖错误和可印刷性的变化变得更加敏感,不可避免地需要开发新的方法来解决摩尔定律的经济问题。与此同时,这种融合将对设计/电路技术以及先进的产量和过程控制技术提出更多的要求。IP集成驱动不同IP(例如:低功耗,高速,射频等)需求的交集,其中需要容错设计来实现HVM。新DFT开发的关键领域是类似模拟的方法,以适应缺陷容限,将需要HSIO,集成RF核心,以及引入非传统的制造方法,以满足成本,质量和可靠性要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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