Development of design rules for reliable tungsten plugs using simulations

M. Islamraja, A. Bariya, K. Saraswat, M. Cappelli, J. Mcvittie, L. Moberly, R. Lahri
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引用次数: 2

Abstract

Design rules for the fabrication of reliable tungsten via plugs, produced using blanket tungsten deposition and etch-back, have been developed using experimental results and computer simulations. Fast computer simulations have been used to define the design rules for this process. The use of computer simulations greatly reduces the number of experiments required to develop a process or to establish design rules. The design rules ensure that the via plugs are void free and that they do not form a severe topography during the etch-back.<>
基于仿真的可靠钨塞设计规则的制定
根据实验结果和计算机模拟,制定了采用毯状钨沉积和反蚀刻工艺生产可靠钨芯塞的设计规则。快速计算机模拟已用于定义该过程的设计规则。计算机模拟的使用大大减少了开发工艺或建立设计规则所需的实验次数。设计规则确保通孔塞无空隙,并且在蚀刻过程中不会形成严重的地形。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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