Circuit Models of Field Emission Silicon Diode and Transistor with a Nanoscale Vacuum Channel

I. D. Evsikov, G. Demin, P. Glagolev, N. Djuzhev, M. A. Makhiboroda, V. Bespalov, S. Filippov, A. G. Kolosko, E. O. Popov
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Abstract

Circuit models of field emission silicon diode and transistor with a nanoscale vacuum channel are presented. Parameters of the equivalent circuit of these vacuum devices such as parasitic resistances and capacitances have been calculated to make an analysis of the circuit performance. Models are based on the modified Fowler-Nordheim equation, taking into account the variation of field-enhancement factors from the geometric parameters at the nanoscale. Output current-voltage characteristics of the diode and transistor were calculated using SPICE simulator. The obtained results can found their practical application in the development of a new generation of nanoscale vacuum channel field emission devices.
具有纳米级真空通道的场发射硅二极管和晶体管电路模型
提出了具有纳米级真空通道的场发射硅二极管和晶体管的电路模型。计算了这些真空器件等效电路的寄生电阻和寄生电容等参数,并对电路性能进行了分析。模型基于修正的Fowler-Nordheim方程,考虑了纳米尺度下几何参数对场增强因子的影响。利用SPICE模拟器计算了二极管和晶体管的输出电流-电压特性。所得结果对新一代纳米级真空通道场发射器件的研制具有实际应用价值。
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