{"title":"Solid-phase epitaxy of Al/sub x/Ga/sub (1-x/)As: kinetics as a function of composition","authors":"S. Hogg, D. Llewellyn, H. Tan, M. Ridgway","doi":"10.1109/COMMAD.1996.610090","DOIUrl":null,"url":null,"abstract":"The solid-phase epitaxy (SPE) of amorphised Al/sub x/Ga/sub (1-x/)As alloys, with x=0-0.46, has been investigated at temperatures over the range 220-310/spl deg/C. Samples were implanted with /sup 74/Ge ions at 200 keV and then annealed. Time resolved reflectivity (TRR) and Rutherford backscattering spectrometry in combination with channeling (RBS/C) were used to deduce the recrystallisation kinetics as a function of Al content. Residual disorder was characterised with RBS/C and cross-sectional transmission electron microscopy (XTEM). The SPE rate exhibited an Arrhenius temperature dependence at all compositions. The activation energy (/spl sim/1.60 eV) and the pre-exponential (on average 4.0/spl times/10/sup 15/ /spl Aring//s) for the process varied little with composition. At all compositions, single crystal regrowth was observed over 200-400 /spl Aring/ followed by the onset of twinning. RBS/C minimum yield values, indicative of the twinned volume fraction, were /spl sim/0.90 independent of Al content.","PeriodicalId":171952,"journal":{"name":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","volume":"101 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1996.610090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The solid-phase epitaxy (SPE) of amorphised Al/sub x/Ga/sub (1-x/)As alloys, with x=0-0.46, has been investigated at temperatures over the range 220-310/spl deg/C. Samples were implanted with /sup 74/Ge ions at 200 keV and then annealed. Time resolved reflectivity (TRR) and Rutherford backscattering spectrometry in combination with channeling (RBS/C) were used to deduce the recrystallisation kinetics as a function of Al content. Residual disorder was characterised with RBS/C and cross-sectional transmission electron microscopy (XTEM). The SPE rate exhibited an Arrhenius temperature dependence at all compositions. The activation energy (/spl sim/1.60 eV) and the pre-exponential (on average 4.0/spl times/10/sup 15/ /spl Aring//s) for the process varied little with composition. At all compositions, single crystal regrowth was observed over 200-400 /spl Aring/ followed by the onset of twinning. RBS/C minimum yield values, indicative of the twinned volume fraction, were /spl sim/0.90 independent of Al content.