An Effective Method For Developing Process Equipment With CFD Simulation

Abstract

The timely supply of new equipment with high performance/cost is being assisted, because of the recent development of simulation. In particular, computational fluid dynamics(CFD) has become an effective method for optimizing the design parameters of semiconductor production equipment without many experimental trials, by modeling fluid flow, heat transfer, and chemical reaction in the chamber. We present such examples of application as the etcher, the furnace, the metal CVD, the wet station, and the wafer prober, etc.