{"title":"Simulation of sub-micron ohmic contacts to GaAs","authors":"Y. Li, H. Harrison, G. K. Reeves","doi":"10.1109/COMMAD.1996.610121","DOIUrl":null,"url":null,"abstract":"Alloyed ohmic contacts to GaAs have been numerically simulated using the Boundary Element Methods. The simulation shows the voltage contours and current contribution in the contact region and external to it and provides characteristics which are unique to sub-micron ohmic contacts. An analytical model developed is in good agreement with the numeral simulation.","PeriodicalId":171952,"journal":{"name":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","volume":"87 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1996.610121","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Alloyed ohmic contacts to GaAs have been numerically simulated using the Boundary Element Methods. The simulation shows the voltage contours and current contribution in the contact region and external to it and provides characteristics which are unique to sub-micron ohmic contacts. An analytical model developed is in good agreement with the numeral simulation.