Bragg grating device fabrication in undoped PMMA mPOF at 266 nm UV waveleng

2019 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference (IMOC) Pub Date : 2019-11-10 DOI:10.1109/IMOC43827.2019.9317608

R. Min, B. Ortega, L. Pereira, T. Paixão, P. André, G. Woyessa, O. Bang, D. Zhong, P. Antunes, J. Pinto, C. Marques

引用次数: 0

Abstract

We present the first results about Bragg grating devices in undoped PMMA POF fabricated with relative low cost Nd:YAG laser (when compared with excimer lasers) at 266 nm wavelength at low transmission loss in 850 nm region. Then temperature, humidity and strain characterizations are supplied for potential applications.

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266nm紫外波长下无掺杂PMMA mPOF Bragg光栅器件的制备

在266nm波长的低成本Nd:YAG激光器(与准分子激光器相比)制备的无掺杂PMMA POF中Bragg光栅器件在850nm区域具有较低的传输损耗。然后为潜在的应用提供温度，湿度和应变特性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2019 SBMO/IEEE MTT-S International Microwave and Optoelectronics Conference (IMOC)

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