The influence of different substrates on GaN films grown by low temperature laser and plasma enhanced MOCVD

H. Zuo, B. Zhou, E. Goldys, M. J. Paterson, T. Tansley
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引用次数: 1

Abstract

We report on the present status of a systematic investigation of GaN thin films grown on sapphire, semi-insulating GaAs and Si substrates under various pre-growth conditions by low temperature laser and plasma enhanced metal-organic chemical vapour deposition. These pre-growth conditions include deposition of buffer layers and surface hydrogenation.
不同衬底对低温激光和等离子体增强MOCVD生长GaN膜的影响
本文报道了利用低温激光和等离子体增强金属有机化学气相沉积技术在蓝宝石、半绝缘GaAs和Si衬底上生长GaN薄膜的研究现状。这些预生长条件包括缓冲层的沉积和表面氢化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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