Engineering change (EC) technology for thin film metallurgy on polyimide films

S. Ray, K. Seshan, M. Interrante
{"title":"Engineering change (EC) technology for thin film metallurgy on polyimide films","authors":"S. Ray, K. Seshan, M. Interrante","doi":"10.1109/ECTC.1990.122220","DOIUrl":null,"url":null,"abstract":"Engineering change in multichip modules such as the IBM Thermal Conduction Module (TCM) requires making new nets on the top surface of the module. This is done either to repair opens or shorts in the internal nets or to correct design errors. Since the trend in multichip packaging in the high end is towards thin-film wiring with polyimide as the dielectric, wire-bond and laser delete processes compatible with thin-film metallurgy on polyimide films are required to carry out engineering change. The authors describe the results of a technology-development effort to optimize these processes on a metal/polyimide thin-film structure.<<ETX>>","PeriodicalId":102875,"journal":{"name":"40th Conference Proceedings on Electronic Components and Technology","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"40th Conference Proceedings on Electronic Components and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.1990.122220","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10

Abstract

Engineering change in multichip modules such as the IBM Thermal Conduction Module (TCM) requires making new nets on the top surface of the module. This is done either to repair opens or shorts in the internal nets or to correct design errors. Since the trend in multichip packaging in the high end is towards thin-film wiring with polyimide as the dielectric, wire-bond and laser delete processes compatible with thin-film metallurgy on polyimide films are required to carry out engineering change. The authors describe the results of a technology-development effort to optimize these processes on a metal/polyimide thin-film structure.<>
聚酰亚胺薄膜冶金的工程改造技术
多芯片模块(如IBM热传导模块(TCM))的工程变更需要在模块的顶部表面制作新的网。这样做是为了修复内部网的开口或短路,或纠正设计错误。由于高端多芯片封装的趋势是以聚酰亚胺为介质的薄膜布线,因此需要在聚酰亚胺薄膜上进行与薄膜冶金相适应的线键和激光删除工艺进行工程化改造。作者描述了在金属/聚酰亚胺薄膜结构上优化这些工艺的技术开发工作的结果。
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3.10
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