Management method for LSI wafer fabrication facilities

T. Tsuyama, T. Harada, J. Nakazato, K. Kubouchi
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引用次数: 1

Abstract

A method is described for analyzing factors causing variations in manufacturing facilities in which monitored data that correlate with product quality are collected during routine operation. By using a method of accumulating deviations from the center value of the monitored data and quality data in time sequence, the fluctuation point can be detected, the correlation checked, and the cause of the variation discovered.<>
大规模集成电路晶圆制造设备管理方法
描述了一种方法,用于分析在日常操作中收集与产品质量相关的监控数据的制造设施中引起变化的因素。通过对监测数据和质量数据在时间序列上的中心值的偏差进行累加,可以检测出波动点,检查相关性,发现变化的原因
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