A yield-driven near-threshold 8-T SRAM design with transient negative bit-line scheme

Chengzhi Jiang, Dayu Zhang, Song Zhang, He Wang, Zhong Zhuang, Faming Yang
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引用次数: 2

Abstract

Increasing process variation and logic delay can significantly degrade the write-ability of near-threshold SRAM cells. In this paper, taking 8-T cell as an example, a transient NBL scheme is adopted to improve the write-ability of SRAM by using a transient negative bit-line voltage at the start of the word-line pulse without complicated on-chip control circuits, which greatly simplifies the design and effectively enhance the write ability. Meanwhile, we draw support from the efficient form of importance sampling and boundary searching methods in order to get our design guide for a better yield. Statistical simulations with a 40nm technology verify the design methodology. Array-level 8-T SRAM design can work under near-threshold Vdd with good performance and acceptable failure rate.
基于暂态负位线方案的产量驱动近阈值8-T SRAM设计
增加过程变化和逻辑延迟会显著降低近阈值SRAM单元的可写性。本文以8-T细胞为例,采用暂态NBL方案,在字行脉冲起始处采用暂态负位线电压,无需复杂的片上控制电路,提高了SRAM的写能力,大大简化了设计,有效提高了写能力。同时,从重要抽样的有效形式和边界搜索方法中得到支持,以获得更好的成品率的设计指南。采用40nm技术的统计仿真验证了设计方法。阵列级8-T SRAM设计可以在接近阈值的Vdd下工作,具有良好的性能和可接受的故障率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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