Effect of pressure on the behavior of cathode spots in oxide removal by are discharge

XXIst International Symposium on Discharges and Electrical Insulation in Vacuum, 2004. Proceedings. ISDEIV. Pub Date : 2006-02-15 DOI:10.2355/ISIJINTERNATIONAL.46.335

H. Takahashi, T. Nakamura, M. Sugimoto, K. Takeda, M. Usio, M. Tanaka

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引用次数: 13

Abstract

The cathode spots of a vacuum arc have smart properties such as preferential attack against oxides and their selective removal. Recently cathode spots have been used for cleaning metal surface before the application of coating or prior to surface modification. The effects of pressure on the cleaning action of the cathode spots were investigated in a wide pressure range from 10 to 2000 Pa of insert atmosphere. Experiments were carried out by using hot rolled steel plates, the surfaces of which were covered with thick oxide of 5-10 μm. Experimental observation revealed the following results: (1) The vacuum arc phenomenon of cathode spots is confirmed even under a pressure as high as 20000 Pa. (2) The number of cathode spots on the oxide surface increased with the increase of pressure in the range of 10 ˜2000 Pa. (3) The removal rate of oxide decreased with the increase of pressure. AI pressures higher than 10000 Pa, the cleaning action (oxide removal) by the cathode spots was only negligibly observed. (4) The cathode spot energy density may possibly decrease with an increase in pressure. (5) The higher the pressure increase, the smaller area the movement of the cathode spots was restricted to. The cleaning area decreased with the increase of pressure.

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压力对放电除氧化物阴极斑点行为的影响

真空电弧的阴极点具有对氧化物的优先攻击和选择性去除等智能特性。近年来，阴极点被用于金属表面涂层前或表面改性前的清洁。在10 ~ 2000 Pa的插入气氛压力范围内，研究了压力对阴极斑点清洗效果的影响。实验采用热轧钢板，钢板表面覆盖5 ~ 10 μm厚的氧化层。实验结果表明:(1)在高达20000 Pa的压力下，阴极光斑的真空弧现象得到了证实。(2)在10 ~ 2000 Pa范围内，随着压力的增加，氧化物表面的阴极斑点数量增加。(3)氧化物的去除率随压力的增大而降低。当压力高于10000 Pa时，阴极斑点的清洁作用(氧化去除)几乎可以忽略不计。(4)阴极光斑能量密度可能随着压力的增大而减小。(5)压力升高越高，阴极斑点的运动受限面积越小。清洗面积随着压力的增大而减小。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

XXIst International Symposium on Discharges and Electrical Insulation in Vacuum, 2004. Proceedings. ISDEIV.

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0.40

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0.00%

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