TCAD modeling of NPN-SiGe-HBT electrical performance improvement through extrinsic stress layer

M. Al-Sa'di, S. Frégonèse, C. Maneux, T. Zimmer
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引用次数: 4

Abstract

The impact of introducing an extrinsic stress layer to NPN-SiGe-HBT device on the electrical properties and frequency response has been studied using TCAD modeling. Simulations based on Hydrodynamic (HD) and Drift-Diffusion (DD) models have been carried out to clarify the influence of adding the extrinsic stress layer on the device electrical performance (static and dynamic). Simulation results show that NPN-SiGe-HBT device with extrinsic stress layer exhibit better frequency characteristics in comparison with equivalent conventional HBT device (without extrinsic stress layer). An approximately, 3% improvement in ft, and 5% improvement in fmax have been achieved. In addition to that, a decrease in the transit time of the device has been observed. That can be fully accounted to the influence of introducing the extrinsic stress layer on the device.
通过外部应力层改善NPN-SiGe-HBT电性能的TCAD建模
采用TCAD模型研究了在NPN-SiGe-HBT器件中引入外部应力层对器件电性能和频率响应的影响。基于流体动力学(HD)和漂移扩散(DD)模型进行了仿真,以阐明添加外部应力层对器件电性能(静态和动态)的影响。仿真结果表明,带外应力层的NPN-SiGe-HBT器件与不带外应力层的等效传统HBT器件相比,具有更好的频率特性。ft改进了约3%,fmax改进了5%。除此之外,还观察到器件的传输时间有所减少。这可以充分考虑到在器件上引入外部应力层的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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