{"title":"TCAD modeling of NPN-SiGe-HBT electrical performance improvement through extrinsic stress layer","authors":"M. Al-Sa'di, S. Frégonèse, C. Maneux, T. Zimmer","doi":"10.1109/MIEL.2010.5490457","DOIUrl":null,"url":null,"abstract":"The impact of introducing an extrinsic stress layer to NPN-SiGe-HBT device on the electrical properties and frequency response has been studied using TCAD modeling. Simulations based on Hydrodynamic (HD) and Drift-Diffusion (DD) models have been carried out to clarify the influence of adding the extrinsic stress layer on the device electrical performance (static and dynamic). Simulation results show that NPN-SiGe-HBT device with extrinsic stress layer exhibit better frequency characteristics in comparison with equivalent conventional HBT device (without extrinsic stress layer). An approximately, 3% improvement in ft, and 5% improvement in fmax have been achieved. In addition to that, a decrease in the transit time of the device has been observed. That can be fully accounted to the influence of introducing the extrinsic stress layer on the device.","PeriodicalId":271286,"journal":{"name":"2010 27th International Conference on Microelectronics Proceedings","volume":"33 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 27th International Conference on Microelectronics Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MIEL.2010.5490457","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
The impact of introducing an extrinsic stress layer to NPN-SiGe-HBT device on the electrical properties and frequency response has been studied using TCAD modeling. Simulations based on Hydrodynamic (HD) and Drift-Diffusion (DD) models have been carried out to clarify the influence of adding the extrinsic stress layer on the device electrical performance (static and dynamic). Simulation results show that NPN-SiGe-HBT device with extrinsic stress layer exhibit better frequency characteristics in comparison with equivalent conventional HBT device (without extrinsic stress layer). An approximately, 3% improvement in ft, and 5% improvement in fmax have been achieved. In addition to that, a decrease in the transit time of the device has been observed. That can be fully accounted to the influence of introducing the extrinsic stress layer on the device.