Development of high current density sheet beam electron gun for Terahertz devices

A. Srivastava, J. So, G. Park, R. S. Raju, Y. Wang, J. Wang
{"title":"Development of high current density sheet beam electron gun for Terahertz devices","authors":"A. Srivastava, J. So, G. Park, R. S. Raju, Y. Wang, J. Wang","doi":"10.1109/IVELEC.2008.4556328","DOIUrl":null,"url":null,"abstract":"The development of high current density sheet beam electron gun for Terahertz devices is carried-out. It operates at beam voltage of 12 kV and perveance 0.0136 mup to meet ours requirement of high beam current density 100 A/cm2 and low emittance 0.068 pi-mm-mrad at the beam-waist position. Currently, mentioned gun is being fabricated. Work has been initiated to test the performance of Scandate cathode using anode-aperture mapping. Current density of 50 A/cm2 has been ensured across the beam cross-section of 100 times 600 mum2.","PeriodicalId":113971,"journal":{"name":"2008 IEEE International Vacuum Electronics Conference","volume":"239 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Vacuum Electronics Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVELEC.2008.4556328","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

The development of high current density sheet beam electron gun for Terahertz devices is carried-out. It operates at beam voltage of 12 kV and perveance 0.0136 mup to meet ours requirement of high beam current density 100 A/cm2 and low emittance 0.068 pi-mm-mrad at the beam-waist position. Currently, mentioned gun is being fabricated. Work has been initiated to test the performance of Scandate cathode using anode-aperture mapping. Current density of 50 A/cm2 has been ensured across the beam cross-section of 100 times 600 mum2.
太赫兹器件用大电流密度片束电子枪的研制
开展了用于太赫兹器件的大电流密度片束电子枪的研制工作。它的工作电压为12 kV,性能为0.0136 mup,以满足我们在束腰位置的高束电流密度100 A/cm2和低发射度0.068 pi-mm-mrad的要求。目前,提到的枪正在制造中。利用阳极-孔径映射法测试Scandate阴极性能的工作已经开始。在100倍600 mum2的梁截面上,电流密度保证为50 A/cm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信