LED-based intracerebral optrode for simultaneous optical stimulation and electrophysiological recording

Elisabeth Otte, S. Ayub, O. Paul, P. Rüther
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Abstract

We present a new type of optrode based on light-emitting diodes (LED) applying a 70μm-thin multifunctional stiffening structure made of silicon (Si). By combining optical and electrical functionalities in a single implantable device, we successfully addressed the requirement of reduced tissue damage during in vivo applications. The improved stiffener comprises apertures (100 μm diameter) used for confining the illumination area of the integrated LEDs and iridium oxide (IrOx) electrodes (40 μm diameter) for electrophysiological recordings. The novel dual-sided wafer-level micromachining process applies wafer bonding and grinding to process 70-μm-thin Si substrates. The lateral dimensions of the optrodes are defined mainly by the size of the commercial LEDs resulting in a shank width and thickness of 283 μm and 80 μm, respectively. The choice of IrOx as electrode material results in a low average electrical impedance of 43.1 kΩ at 1 kHz. Despite the aperture-confined illumination area, light intensities of 7.85 μW (emittance: 1 mW/mm2) well above the stimulation threshold are achieved at sub-milliwatt electrical power.
基于led的脑内光电电极,用于同时进行光刺激和电生理记录
提出了一种基于发光二极管(LED)的新型光极,采用70μm薄的硅(Si)多功能强化结构。通过在单个植入式装置中结合光学和电子功能,我们成功地解决了在体内应用过程中减少组织损伤的要求。改进的强化板包括用于限制集成led照明区域的孔径(直径100 μm)和用于电生理记录的氧化铱(IrOx)电极(直径40 μm)。采用晶圆键合和磨削技术加工70 μm薄Si衬底的双面晶圆级微加工工艺。正极的横向尺寸主要由商用led的尺寸决定,其杆宽和厚度分别为283 μm和80 μm。选择IrOx作为电极材料,在1khz时平均电阻抗为43.1 kΩ。在亚毫瓦电功率下,尽管有孔径限制的照明区域,但光强达到7.85 μW(发射度:1 mW/mm2),远高于刺激阈值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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