Double-Gate FDSOI Based SRAM Bitcell Circuit Designs with Different Back-Gate Biasing Configurations

M. Mohammed, Athiya Nizam, M. Chowdhury
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引用次数: 3

Abstract

Power saving techniques have become essential for modern digital systems. Large on-chip SRAM memories are used in these systems and therefore it is necessary to optimize SRAM bitcell circuit to minimize the power consumption. In addition to this, it is equally important to design SRAM cell with high reliability and stability. Power gating technique with sleep transistor if applied to SRAM cell will degrade the performance of the cell. In this paper, Fully Depleted Silicon-on-Insulator (FDSOI) device based SRAM designs are proposed which eliminate the requirement of sleep transistors to reduce the power consumption. This reduces overall complexity and overheads of power gating memory designs. Based on this approach seven SRAM bitcell configurations are presented in the paper. Performance metrics of different SRAM configurations are evaluated and compared in HSPICE.
基于双栅FDSOI的SRAM位元电路设计
节能技术已成为现代数字系统必不可少的技术。在这些系统中使用了大型片上SRAM存储器,因此有必要优化SRAM位元电路以最小化功耗。除此之外,设计具有高可靠性和稳定性的SRAM单元也同样重要。睡眠晶体管的功率门控技术如果应用于SRAM电池,将会降低电池的性能。本文提出了一种基于全耗尽绝缘体上硅(FDSOI)器件的SRAM设计方案,消除了对休眠晶体管的需求,从而降低了SRAM的功耗。这降低了电源门控存储器设计的总体复杂性和开销。基于这种方法,本文提出了7种SRAM位元结构。在HSPICE中对不同SRAM配置的性能指标进行了评估和比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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