Evaluating a New RRAM Manufacturing Test Strategy

T. Copetti, A. Castelnuovo, T. Gemmeke, L. Bolzani
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引用次数: 1

Abstract

Memristive devices represent a promising candidate to complement the CMOS technology due to their ability to overcome CMOS device technology limits as well as to implement not only memory but also computing elements. These characteristics make the implementation of emerging applications with strict constraints in terms of performance, area and power consumption possible. However, the adoption of these novel devices depends on being able to guarantee their quality after manufacturing. High-volume manufacturing tests pose significant challenges in terms of fault detection capability, test time as well as implementation overheads. In this context, this paper proposes a new implementation Design-for-Testability (DfT) strategy to test Resistive Random Access Memories (RRAMs). A case study based on a RRAM was implemented using the 28nm TSMC technology library and validated through electrical simulations. The new DfT strategy was evaluated with respect to its ability to detect unique and conventional faults. Finally, the paper presents a discussion about the introduced overheads and compares the proposed approach with state-of-the-art related to RRAM manufacturing test strategies.
评价一种新的RRAM制造测试策略
忆阻器件具有克服CMOS器件技术限制的能力,不仅可以实现存储器,还可以实现计算元件,因此是CMOS技术的一个有希望的补充。这些特性使得在性能、面积和功耗方面有严格限制的新兴应用的实现成为可能。然而,这些新型装置的采用取决于能够保证其制造后的质量。大批量生产测试在故障检测能力、测试时间和实现开销方面提出了重大挑战。在此背景下,本文提出了一种新的可测试性设计(DfT)实现策略来测试电阻性随机存取存储器(rram)。采用28nm台积电技术库实现了基于RRAM的案例研究,并通过电学模拟进行了验证。对新的DfT策略进行了检测独特故障和常规故障的能力评估。最后,本文对引入的开销进行了讨论,并将所提出的方法与与RRAM制造测试策略相关的最新方法进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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