Remote equipment diagnosis for metal etching process

Abstract

End point detector waveform analysis and machine-to-machine difference analysis are expected to realize shortening process development time of new products for the metal etching process. The high reliability of collecting data such as maintenance is expected to improve equipment performance. We developed a process monitoring system (PMS) which has been installed in our /spl phi/ 200 wafer fab. PMS is a remote equipment diagnostics system. PMS collects EPD waveform data, maintenance data and so on. EPD waveform analysis such as wafer-to-wafer, lot-to-lot and machine-to-machine supports shortening process development time. PMS also improves overall equipment efficiency (OEE) and reduces waiting time for the instruction from process staff.