Aluminum nitride films for optical applications

1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings Pub Date : 1996-10-09 DOI:10.1109/SMICND.1996.557473

V. Dumitru, E. Cimpoiasu, C. Morosanu, C. Nenu, D. Necsoiu

引用次数: 1

Abstract

Hard and adherent AlN layers on glass have been deposited by reactive magnetron sputtering. The deposition rate, the structure and the optical properties have been investigated mainly with respect to possible optical applications.

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光学用氮化铝薄膜

用反应磁控溅射技术在玻璃表面沉积了坚硬的氮化铝层。研究了其沉积速率、结构和光学性能，主要着眼于其可能的光学应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings

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